J. Phys. IV France
Volume 11, Numéro PR2, Juillet 2001
X-Ray Lasers 2000
Page(s) Pr2-443 - Pr2-449
7th International Conference on X-Ray Lasers

J. Phys. IV France 11 (2001) Pr2-443-Pr2-449

DOI: 10.1051/jp4:2001286

Applications of short wavelength radiation : Soft X-ray microscopy and EUV lithography

D.T. Attwood

Applied Science and Technology Graduate Group, University of California at Berkeley, and Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, U.S.A.

Short wavelength radiation, in the 1-20 nm wavelength range is discussed, with particular emphasis on applications to soft x-ray (SXR) microscopy and extreme ultraviolet (EUV) radiation. In this paper we bring attention to the fact that these two applications require a wide variety of SXR/EUV sources, some with good spatial coherence, others largely incoherent ; some at fairly high average power (tens of watts), others at rather low (microwatts) power ; some at fixed wavelength, others tunable. These provide great opportunities for attendees of this workshop who represent the world's body of knowledge in this area. We give reference to recent papers to illustrate these points, and call attention to recurring publications where further opportunities and progress can be monitored.

© EDP Sciences 2001