Numéro
J. Phys. IV France
Volume 132, March 2006
Page(s) 147 - 151
DOI https://doi.org/10.1051/jp4:2006132029
Publié en ligne 11 mars 2006
10th International Conference on the Formation of Semiconductor Interfaces
C. Girardeaux, et al.
J. Phys. IV France 132 (2006) 147-151

DOI: 10.1051/jp4:2006132029

Surface reactivity of InSb studied by cyclic voltammetry coupled to XPS

B. Künstler-Hourriez1, 2, B. Erné3, F. Lefévre4, D. Lorans2, B. Canava1, M. Herlem1 and A. Etcheberry1

1  SAGEM Défense-Sécurité, 70-74 rue de la Tour Billy, 95100 Argenteuil, France
2  Institut Lavoisier-IREM (UMR-CNRS 8637), Université de Versailles, 45 avenue des États Unis, 78035 Versailles, France
3  Physical & Colloid Chemistry, Van't Hoff Laboratory, Utrecht University, Utrecht, The Netherlands
4  DGA, 8 Bd. Victor, 75015 Paris, France


Abstract
The surface chemistry of InSb was modified by anodic treatment at different pH. Using a coupled approach based on electrochemical and surface analysis techniques we determined different chemical configurations for the oxidized InSb surface. Sb-rich oxidized surfaces or stoichiometric ones have been obtained.



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