| Numéro |
J. Phys. IV France
Volume 12, Numéro 4, June 2002
|
|
|---|---|---|
| Page(s) | 63 - 68 | |
| DOI | https://doi.org/10.1051/jp4:20020078 | |
J. Phys. IV France 12 (2002) Pr4-63
DOI: 10.1051/jp4:20020078
Advances in the use of MOCVD methods for the production of novel photonic bandgap materials
D.E. Whitehead1, M.E. Pemble1, H.M. Yates1, A. Blanco2, C. Lopez2, H. Miguez2 and F.J. Meseguer21 School of Sciences, University of Salford, Salford M5 4WT, U.K.
2 Instituto de Ciencia de Materiales de Madrid, CSIC, Campus de Cantoblanco, 28049 Madrid, Spain
Abstract
We describe the use of novel MOCVD methods designed to infill templated structures based upon
synthetic opals in order to provide increased refractive index contrast necessary for the creation of full photonic
bandgap materials. The method employed is illustrated by considering the production of structures containing III-V
material Gap and using this example, we demonstrate the ability to achieve levels of infill higher than any previously
reported. We describe the use of novel MOCVD chemistry in the creation of a potentially new class of inorganic
material, potentially capable of direct luminescence from within the photonic bandgap system.
© EDP Sciences 2002