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J. Phys. IV France Vol. 12 No. 4

Journal de Physique IV (Proceedings)

Vol. 12 No. 4 (June 2002)

EUROCVD 13 - Late News Thirteenth European Conference on Chemical Vapor Deposition
Glyfada, Athens, Greece, August 26-31, 2001

Dimitris Davazoglou, Constantin Vahlas

ISBN 2-86883-569-4



  • Foreword     p. V
    Dimitris Davazoglou and Constantin Vahlas
    Abstract 


  • Molecular ways to nanoscale particles and films     p. 1
    H. Shen and S. Mathur
    Abstract | PDF file (746 KB)


  • Real time monitoring of the growth of metallic thin films by in situ pyrometry     p. 9
    C. Gasqueres, F. Maury and F. Ossola
    Abstract | PDF file (473 KB)


  • Preliminary studies of atmospheric pressure plasma enhanced CVD (AP-PECVD) of thin oxide films     p. 17
    N. McSporran, M.L. Hitchman, S.E. Alexandrov, S.H. Shamlian, S. Turnbull and S. Turnbull
    Abstract | PDF file (439 KB)


  • Reflectance anisotropy studies of the oxidation of (001) GaAs surfaces in an MOCVD reactor     p. 25
    M.N. Simcock, L. He and M.E. Pemble
    Abstract | PDF file (268 KB)


  • Controlled-growth of platinum nanoparticles on carbon nanotubes or nanospheres by MOCVD in fluidized bed reactor     p. 29
    P. Serp, R. Feurer, J.L. Faria and J.L. Figueiredo
    Abstract | PDF file (1.68 MB)


  • Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, 0 3, TMB, TMP I: Determination of a chemical mechanism     p. 37
    J.-P. Nieto, B. Caussat, J.-P. Couderc, I. Orain' and L. Jeannerot
    Abstract | PDF file (464 KB)


  • Design, synthesis, and application of new Ti precursors compatible with Ba and Sr precursors for BST thin film by MOCVD     p. 45
    K. Woo
    Abstract | PDF file (454 KB)


  • Simulation and validation of SiO 2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor     p. 51
    G.J. Schoof, C.R. Kleijn, H.E.A. Van Den Akker, T.G.M. Oosterlaken, H.J.C.M. Terhorst and F. Huussen
    Abstract | PDF file (619 KB)


  • Advances in the use of MOCVD methods for the production of novel photonic bandgap materials     p. 63
    D.E. Whitehead, M.E. Pemble, H.M. Yates, A. Blanco, C. Lopez, H. Miguez and F.J. Meseguer
    Abstract | PDF file (540 KB)


  • Evaluation of corrosion behaviour of tantalum coating obtained by low pressure chemical vapor deposition using electrochemical polarization     p. 69
    A. Levesque, A. Bouteville, H. de Baynast and B. Laveissière
    Abstract | PDF file (703 KB)


  • Molecular beam mass spectrometry analysis of gaseous species responsible for diamond deposition in microwave plasmas     p. 75
    O. Aubry, J.-L. Delfau, C. Met, M.I. De Barros, L. Vandenbulcke and C. Vovelle
    Abstract | PDF file (652 KB)


  • A study by GC-MS of the decomposition of precursors for the MOCVD of high temperature superconductors     p. 85
    O.V. Lopaeva, M.L. Hitchman, S.H. Shamlian and D.R. Watson
    Abstract | PDF file (481 KB)


  • Growth of carbon nanotubes by fluidized bed catalytic chemical vapor deposition     p. 93
    D. Venegoni, P. Serp, R. Feurer, Y. Kihn, C. Vahlas and P. Kalck
    Abstract | PDF file (830 KB)


  • Vapor-phase synthesis and characterization of ZnSe nanoparticles     p. 99
    D. Sarigiannis, R.P. Pawlowski, J.D. Peck, T.J. Mountziaris, G. Kioseoglou and A. Petrou
    Abstract | PDF file (701 KB)


  • Modification of multiwalled carbon nanotubes by different breaking processes     p. 107
    I. Vesselényi, A. Siska, D. Méhn, K. Niesz, Z. Konya, J.B. Nagy and I. Kiricsi
    Abstract | PDF file (510 KB)


  • Unveiling the magic of H 2S on the CVD-Al 2O 3 coating. Effect of H 2S on the water gas concentration     p. 113
    T. Oshika, M. Sato and A. Nishiyama
    Abstract | PDF file (513 KB)


  • Multi-model hierarchy approach to simulate barrel reactors for epitaxial silicon deposition     p. 121
    M. Di Stanislao, G. Valente, S. Fascella, C. Spampinato, M. Masi and S. Carrà
    Abstract | PDF file (592 KB)


  • Hydrogen storage in carbon nanotubes produced by CVD     p. 129
    A. Fonseca, N. Pierard, S. Tollis, G. Bister, Z. Konya, N. Nagaraju and J.B. Nagy
    Abstract | PDF file (664 KB)


  • MOCVD of aluminium oxide films using aluminium $\beta$-diketonates as precursors     p. 139
    A. Devi, S.A. Shivashankar and A.G. Samuelson
    Abstract | PDF file (745 KB)


  • Conductive Cu-TiO2 thin films obtained via MOCVD     p. 147
    F. Alvarez y Quintavalle, G.A. Battiston, U. Casellato, D. Fregona, R. Gerbasi and F. Loro
    Abstract | PDF file (651 KB)


  • Characterization of amorphous SIC:H thin films grown by RF plasma enhanced CVD on annealing temperature     p. 155
    M.G. Park, W.S. Choi, J.-H. Boo, Y.T. Kim, D.H. Yoon and B. Hong
    Abstract | PDF file (336 KB)







© EDP Sciences 2002