Numéro
J. Phys. IV France
Volume 04, Numéro C9, Novembre 1994
Proceedings of the European Symposium on Frontiers in Science and Technology with Synchrotron Radiation
Page(s) C9-171 - C9-174
DOI https://doi.org/10.1051/jp4:1994928
Proceedings of the European Symposium on Frontiers in Science and Technology with Synchrotron Radiation

J. Phys. IV France 04 (1994) C9-171-C9-174

DOI: 10.1051/jp4:1994928

Characterization of roughness correlations in W/Si multilayers by diffuse x-ray scattering

T. Salditt, T.H. Metzger and J. Peisl

Universität München, Sektion Physik, Geschwister Scholl Platz 1, 80539 München, Germany


Abstract
We present diffuse, nonspecular x-ray measurements of the interface height-height self-correlations in an amorphous W/Si multilayer. The measurements have been performed in a scattering geometry that is placed out of the plane of reflection, giving access to a much larger range in parallel momentum transfer than in conventional nonspecular geometries. For the sample studied a logarithmic form of the correlation function is found.



© EDP Sciences 1994