Numéro |
J. Phys. IV France
Volume 04, Numéro C9, Novembre 1994
Proceedings of the European Symposium on Frontiers in Science and Technology with Synchrotron Radiation
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Page(s) | C9-171 - C9-174 | |
DOI | https://doi.org/10.1051/jp4:1994928 |
Proceedings of the European Symposium on Frontiers in Science and Technology with Synchrotron Radiation
J. Phys. IV France 04 (1994) C9-171-C9-174
DOI: 10.1051/jp4:1994928
Universität München, Sektion Physik, Geschwister Scholl Platz 1, 80539 München, Germany
© EDP Sciences 1994
J. Phys. IV France 04 (1994) C9-171-C9-174
DOI: 10.1051/jp4:1994928
Characterization of roughness correlations in W/Si multilayers by diffuse x-ray scattering
T. Salditt, T.H. Metzger and J. PeislUniversität München, Sektion Physik, Geschwister Scholl Platz 1, 80539 München, Germany
Abstract
We present diffuse, nonspecular x-ray measurements of the interface height-height self-correlations in an amorphous W/Si multilayer. The measurements have been performed in a scattering geometry that is placed out of the plane of reflection, giving access to a much larger range in parallel momentum transfer than in conventional nonspecular geometries. For the sample studied a logarithmic form of the correlation function is found.
© EDP Sciences 1994