J. Phys. IV France 04 (1994) C9-171-C9-174
Characterization of roughness correlations in W/Si multilayers by diffuse x-ray scatteringT. Salditt, T.H. Metzger and J. Peisl
Universität München, Sektion Physik, Geschwister Scholl Platz 1, 80539 München, Germany
We present diffuse, nonspecular x-ray measurements of the interface height-height self-correlations in an amorphous W/Si multilayer. The measurements have been performed in a scattering geometry that is placed out of the plane of reflection, giving access to a much larger range in parallel momentum transfer than in conventional nonspecular geometries. For the sample studied a logarithmic form of the correlation function is found.
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