Journal de Physique IV

Simulation and validation of SiO₂ LPCVD from TEOS in a vertical 300 mm multi-wafer reactor

G.J. Schoof, C.R. Kleijn, H.E.A. Van Den Akker, T.G.M. Oosterlaken, H.J.C.M. Terhorst and F. Huussen

J. Phys. IV France, 12 4 (2002) 51-61

DOI: 10.1051/jp4:20020077

G.J. Schoof

C.R. Kleijn

H.E.A. Van Den Akker

T.G.M. Oosterlaken

H.J.C.M. Terhorst

F. Huussen

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