J. Phys. IV France
Volume 133, June 2006
|Page(s)||187 - 191|
|Publié en ligne||16 juin 2006|
J.-C. Gauthier, et al.
J. Phys. IV France 133 (2006) 187-191
Yield versus ablator roughness for a graded Ge doped plastic ablator LMJ capsuleP. Seytor, D. Galmiche and C. Cherfils
CEA/DAM-Ile de France, BP. 12, 91680 Bruyères-le-Châtel, France
A base-line capsule design for the Laser MegaJoule facility is optimized by radially grading the Ge dopant in plastic ablator. A one dimensional robustness study is performed to optimize the implosion and the entropy deposition. Then, the tolerance versus the ablator roughness is examined for modes over 10 through direct two-dimensional simulations. The stability is significantly higher than that of an uniformly doped design.
© EDP Sciences 2006