J. Phys. IV France
Volume 104, March 2003
|Page(s)||197 - 201|
J. Phys. IV France 104 (2003) 197
Hard real time control software for use in electron beam lithography with an emphasis on patterns with radial symmetryS. Heim, S. Rudolph, D. Rudolph and G. Schmahl
Institute for X-Ray Physics, Georg-August-Universität Göttingen, Geiststrasse 11, 37073 Göttingen, Germany
In order to overcome the limitations with existing electron beam lithography control Systems a complete beam control software System has been implemented from scratch, therefore allowing for optimizations especially for patterns with radial symmetry during each stage of the deployment process.
© EDP Sciences 2003