| Numéro |
J. Phys. IV France
Volume 104, March 2003
|
|
|---|---|---|
| Page(s) | 197 - 201 | |
| DOI | https://doi.org/10.1051/jp4:200300060 | |
J. Phys. IV France 104 (2003) 197
DOI: 10.1051/jp4:200300060
Hard real time control software for use in electron beam lithography with an emphasis on patterns with radial symmetry
S. Heim, S. Rudolph, D. Rudolph and G. SchmahlInstitute for X-Ray Physics, Georg-August-Universität Göttingen, Geiststrasse 11, 37073 Göttingen, Germany
Abstract
In order to overcome the limitations with existing electron beam lithography
control Systems a complete beam control software System has been implemented from
scratch, therefore allowing for optimizations especially for patterns with radial symmetry
during each stage of the deployment process.
© EDP Sciences 2003