Numéro |
J. Phys. IV France
Volume 104, March 2003
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Page(s) | 171 - 176 | |
DOI | https://doi.org/10.1051/jp4:200300055 |
J. Phys. IV France 104 (2003) 171
DOI: 10.1051/jp4:200300055
Diffractive soft and hard X-ray optics
C. David1, B. Nöhammer1, H.H. Solak1, F. Glaus1, B. Haas1, A. Grubelnik1, A. Dolocan1, E. Ziegler2, O. Hignette2, M. Burghammer2, B. Kaulich2, J. Susini2, J.H.H. Bongaerts3 and J.F. van der Veen11 Laboratory for Micro-and Nanotechnology, Paul Scherrer Institut, 5232 Villigen, Switzerland
2 European Synchrotron Radiation Facility, BP. 220, 38043 Grenoble cedex, France
3 2 Van der Waals-Zeeman Institut, University of Amsterdam, Valckenierstr. 65, 1018 XE Amsterdam, The Netherlands
Abstract
The Laboratory for Micro- and Nanotechnology provides the essential technologies necessary for the
design and fabrication of diffractive x-ray optics for a wide range of applications. Over the past years, a large variety
of optics has been fabricated and tested in collaboration with a large number of partners. To ensure good
performance of the devices, they have to be tailored to the specific needs of a specific x-ray optical experiment in
terms of photon energy and spatial coherence of the source, as well as required spatial resolution, working distance
and diffraction efficiency. We report on a selection of such developments including transmission Fresnel phase zone
plates for microscopy or microprobe applications at photon energies ranging from the EUV to the multi-keV region.
For photon energies beyond 10 keV transmission zone plates are very rarely used. Our recent development of linear
optics with ultra high aspect ratio structures has opened up a way to extend the applications of diffractive optics at
least to the 30 keV range. Besides focusing elements, other diffractive optics such as decoherers or beam splitters for
interferometric applications are presented.
© EDP Sciences 2003