| Numéro |
J. Phys. IV France
Volume 104, March 2003
|
|
|---|---|---|
| Page(s) | 99 - 102 | |
| DOI | https://doi.org/10.1051/jp4:200300038 | |
J. Phys. IV France 104 (2003) 99
DOI: 10.1051/jp4:200300038
High lateral resolution spectroscopic imaging of surfaces: The undulator beamline "nanospectroscopy" at Elettra
A. Locatelli1, A. Bianco1, D. Cocco1, S. Cherifi1, S. Heun1, M. Marsi1, M. Pasqualetto1 and E. Bauer21 Sincrotrone Trieste S.C.p.A., S.S. 14 - Km 163.5 in Area Science Park, 34012 Basovizza, Trieste, Italy
2 Department of Physics and Astronomy, Arizona State University, Tempe, AZ 85287-1504, U.S.A.
Abstract
High lateral resolution direct imaging of surfaces with chemical sensitivity is of increasing importance
for basic and applied research in the field of surface and materials science. A novel and versatile beamline, to be
employed for the spectromicroscopic study of surfaces in the submicron range, is now available at Elettra. The
beamline, named "Nanospectroscopy", serves an end-station equipped with a Spectroscopic Photo-Emission and
Low Energy Electron Microscope (SPELEEM). This microscope combines the ability to perform XPEEM (X-ray
Photo-Emission Electron Microscopy), small spot XPS (X-ray Photoelectron Spectroscopy), XPD (X-ray
Photoelectron Diffraction), LEEM and LEED (Low Energy Electron Microscopy and Diffraction, respectively).
© EDP Sciences 2003