| Numéro |
J. Phys. IV France
Volume 12, Numéro 4, June 2002
|
|
|---|---|---|
| Page(s) | 37 - 44 | |
| DOI | https://doi.org/10.1051/jp4:20020075 | |
J. Phys. IV France 12 (2002) Pr4-37
DOI: 10.1051/jp4:20020075
Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, 0 3, TMB, TMP I: Determination of a chemical mechanism
J.-P. Nieto1, B. Caussat1, J.-P. Couderc1, I. Orain'2 and L. Jeannerot21 Laboratoire de Génie Chimique, UMR 5503 du CNRS, ENSIGC, Institut National Polytechnique de Toulouse, 18 chemin de la Loge, 31078 Toulouse cedex, France
2 ATMEL ES2, Zone Industrielle, 13106 Rousset cedex, France
Abstract
APCVD of boro-phospho silicate glass from mixtures of TEOS, TMB and TMP, has been analysed then modelled in a continuous reactor.
A reduced chemical mechanism has been developed and the corresponding rate constants have been identified. The first results
obtained are encouraging and suggest that the very simple gas phase chemistry selected could be precise enough to represent
the main trends of this very complex deposition procedure.
© EDP Sciences 2002