Numéro |
J. Phys. IV France
Volume 11, Numéro PR11, Décembre 2001
International Conference on Thin Film Deposition of Oxide Multilayers Hybrid Structures
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Page(s) | Pr11-325 - Pr11-329 | |
DOI | https://doi.org/10.1051/jp4:20011153 |
J. Phys. IV France 11 (2001) Pr11-325-Pr11-329
DOI: 10.1051/jp4:20011153
Erbium doped yttria thin films deposited by injection CVD
J.L. Deschanvres and W. MeffreLaboratoire des Matériaux et du Génie Physique, CNRS/ENSPG, BP. 46, 38402 Saint-Martin-d'Hères, France
Abstract
The deposition of Er doped Y2O3 thin films by a pulsed injection assisted MO-CVD process is studied. Well crystallised Er : Y2O3 films with a columnar growth structure were deposited between 600°C and 900°C. In some cases a monoclinic phase was obtained with the classical yttria cubic phase. The preferential crystalline orientation for the cubic phase ( [111] or [100] ) depended on the deposition temperature and on the oxygen content of the carrier gas. Because the Er and Y precursors are chemically similar (Er or Y tetramethylheptanedionate), the composition of the deposited films are closed to the composition of the solution. The Er luminescence was obtained for all the as deposited samples.
The green and Infrared4I13/2 → 4I15/2 transition were observed. The lifetime of 4I13/2 level increased with the deposition temperature. The lifetime of the 4I13/2 level decreased with the erbium content due to up conversion effect. A lifetime of 7.5ms, closed to the bulk value, was obtained at low erbium concentration.
© EDP Sciences 2001