| Numéro |
J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
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|---|---|---|
| Page(s) | Pr3-703 - Pr3-713 | |
| DOI | https://doi.org/10.1051/jp4:2001389 | |
Thirteenth European Conference on Chemical Vapor Deposition
J. Phys. IV France 11 (2001) Pr3-703-Pr3-713
DOI: 10.1051/jp4:2001389
1 Angewandte Physik, Johannes Kepler Universität Linz, 4040 Linz, Austria
2 Louisiana Tech. University, IfM, P.O. Box 10137, Ruston, LA 71272, U.S.A.
3 Angström Laboratory, Uppsala University, Box 534, 75121 Uppsala, Sweden
4 Institut für Industrielle Elektronik und Materialwissenschaften, Technische Universität Wien, 1040 Vienna, Austria
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr3-703-Pr3-713
DOI: 10.1051/jp4:2001389
Photon assisted CVD
K. Piglmayer1, M. Boman2, M. Lindstam3 and R. Chabicovsky41 Angewandte Physik, Johannes Kepler Universität Linz, 4040 Linz, Austria
2 Louisiana Tech. University, IfM, P.O. Box 10137, Ruston, LA 71272, U.S.A.
3 Angström Laboratory, Uppsala University, Box 534, 75121 Uppsala, Sweden
4 Institut für Industrielle Elektronik und Materialwissenschaften, Technische Universität Wien, 1040 Vienna, Austria
Abstract
Various aspects of photon-matter interactions are discussed in the frame of applications to chemical vapor deposition processes. Based on the examples of carbon and tungsten deposition, the influences of photon sources like lamps, pulsed- or cw-lasers on the deposition mechanisms are outlined. Peculiarities arising from the different interactions of photons with the gas phase and/or the substrate surface and their effect on the compositional or structural characteristics of the deposited material are described.
© EDP Sciences 2001