J. Phys. IV France
Volume 11, Numéro PR3, Août 2001Thirteenth European Conference on Chemical Vapor Deposition
|Page(s)||Pr3-307 - Pr3-313|
J. Phys. IV France 11 (2001) Pr3-307-Pr3-313
An extended interpretation of chemical vapor infiltration of carbonZ.J. Hu, W.G. Zhang and K.J. Hüttinger
Institut für Chemische Technik, Universität Karlsruhe, Kaiserstr. 12, 76128 Karlsruhe, Germany
Chemical vapor infiltration of carbon with methane as carbon source was studied considering complex deposition chemistry and kinetics. Numerical simulations of the infiltration of capillaries showed deposition profiles increasing from the mouth to the depth of the capillary provided that residence time and thus predecomposition of methane outside of the capillary are sufficiently short or small, respectively. The increase of the deposition profile is significantly enhanced with increasing complexity of deposition chemistry (length of the reaction sequence of gas phase reactions), increasing depth of the capillary and increasing methane pressure. The results were experimentally confirmed by corresponding infiltration experiments. As compared to these results, decreasing deposition profiles are only known from literature.
© EDP Sciences 2001