J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-1183 - Pr3-1190
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-1183-Pr3-1190

DOI: 10.1051/jp4:20013149

Area selective OMCVD of gold and palladium on self-assembled organic monolayers : Control of nucleation sites

R.A. Fischer1, U. Weckenmann1, C. Winter1, J. Käshammer2, V. Scheumann2 and S. Mittler2

1  Anorganische Chemie II, Ruhr-Universität Bochum, 44780 Bochum, Germany
2  Max-Planck Institut für Polymerforschung, Ackermann Weg 10, 55128 Mainz, Germany

The area selective organometallic chemical vapor deposition (OMCVD) of gold and palladium onto self-assembled monolayers (SAMs) of 4'-functionalized long chain alkanethiols and 4'-functionalized biphenylthiols was investigated. Trimethylphosphine-methylgold (Me3PAuMe) and cyclopentadienyl-allyl-palladium (Cp(allyl)Pd) were used as organometallic precursors. X-ray photoelectron spectroscopy (XPS) revealed that in both cases nucleation occurs selectively only on thiol terminated surfaces even at very mild conditions whereas nucleation is inhibited on methyl- and hydroxy-terminated SAMs. It has been shown that it is possible to control the number of gold clusters per area by depositing gold onto mixed SAMs consisting of biphenylthiol and 4'-biphenyldithiol with varying molar ratios.

© EDP Sciences 2001