Numéro |
J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
|
|
---|---|---|
Page(s) | Pr3-39 - Pr3-46 | |
DOI | https://doi.org/10.1051/jp4:2001305 |
Thirteenth European Conference on Chemical Vapor Deposition
J. Phys. IV France 11 (2001) Pr3-39-Pr3-46
DOI: 10.1051/jp4:2001305
Institut de Science et de Génie des Matériaux et Procédés, UPR 8521 du CNRS, avenue de Villeneuve, 66860 Perpignan cedex, France
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr3-39-Pr3-46
DOI: 10.1051/jp4:2001305
Thermodynamic and kinetic criteria to select hydrocarbon precursor
S. de Persis and F. TeyssandierInstitut de Science et de Génie des Matériaux et Procédés, UPR 8521 du CNRS, avenue de Villeneuve, 66860 Perpignan cedex, France
Abstract
Several hydrocarbons are available to provide carbon to a deposit. In the case of silicon carbide epitaxy, propane is usually used as precursor though it is not stable under the conditions required by the process. In the present paper, thermodynamic and kinetic criteria are used to compare hydrocarbon precursors with respect to their reactivity during their gas-phase transportation in the CVD reactor. The influence of propane, methane or acetylene precursors is discussed according to residence time.
© EDP Sciences 2001