J. Phys. IV France
Volume 11, Numéro PR2, Juillet 2001X-Ray Lasers 2000
|Page(s)||Pr2-509 - Pr2-510|
J. Phys. IV France 11 (2001) Pr2-509-Pr2-510
Development of multilayer coatings and spin-off to XRL applicationsF. Bijkerk
FOM Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, 34309 MN Nieuwegein, The Netherlands
The substantially increased effort on multilayer coating technology, as motivated currently by the application of Mo/Si coatings in Extreme UV lithography, is expected to have a beneficial effect on the technology for multilayer optics in the XUV wavelength range in general. Some examples of new usage of multilayer structures in XRL research are given.
© EDP Sciences 2001