| Numéro |
J. Phys. IV France
Volume 11, Numéro PR2, Juillet 2001
X-Ray Lasers 2000
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|---|---|---|
| Page(s) | Pr2-413 - Pr2-416 | |
| DOI | https://doi.org/10.1051/jp4:2001279 | |
7th International Conference on X-Ray Lasers
J. Phys. IV France 11 (2001) Pr2-413-Pr2-416
DOI: 10.1051/jp4:2001279
GREMI-ESPEO, UMR 6606 du CNRS, Université d'Orléans, BP. 6744, 45067 Orléans cedex 2, France
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr2-413-Pr2-416
DOI: 10.1051/jp4:2001279
Investigation of various capillary discharge schemes for incoherent EUV production
E. Robert, B. Blagojevic, M. Idrissi, D. Hong, C. Cachoncinlle, R. Viladrosa, J.-M. Pouvesle and C. FleurierGREMI-ESPEO, UMR 6606 du CNRS, Université d'Orléans, BP. 6744, 45067 Orléans cedex 2, France
Abstract
The investigation of different capillary discharges (fast capillary, ablative and EUV flash) powered by pulsed Blumlein type drivers is presented. A parametric study has been perforrned on xenon fast capillary discharges. Charging voltage, gas pressure, capillary volume (length and diameter) effects have been studied, emphasizing the crucial importance of power density for the efficient production of EUV radiation. First estimation of radiated energy around 13.5 nm is finally presented. An irradiance of one hundred of [MATH] at 75 cm from the xenon source has been measured and this value will probably be enhanced through the optimization of the discharge efficiency.
© EDP Sciences 2001