Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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J. Phys. IV France 10 (2000) Pr2-19-Pr2-26
DOI: 10.1051/jp4:2000203

Formation and deposition of MoS₂-nanoparticles

H. Keune¹, W. Lacom², F. Rossi³, E. Stoffels⁴, W.W. Stoffels⁴ and G. Wahl<sup>1

1</sup>  Technische Universität Braunschweig, Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, 38108 Braunschweig, Germany
²  Österreichisches Forschungszentrum Seibersdorf, 2444 Seibersdorf, Austria
³  CEC Joint Research Centre, Institute for Health and Consumer Protection, TP203, 21020 Ispra (VA), Italy
⁴  Eindhoven University of Technology, Department of Physics, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

Abstract
An in-situ process is under development to create a dispersed phase of lubricant MoS₂ nanoparticles in a matrix of a hard TiN coating. The particles were formed by the reaction system MoCl₅/H₂S and MoCl₅/S₈. According to the requirements of a high temperature TiN CVD process and a low temperature TiN PACVD process, the particle formation at different total and partial pressures has been investigated. High yields of particles with diameters of 30 - 50 nm were obtained thermally at temperatures > 300°C and pressures > 5hPa with MoCl₅/H₂S as precursors. In the low pressure range particles were formed by a plasma CVD process using the reaction of elementary sulphur or H₂S with MoCl₅. The particles were investigated by laser light scattering, electron microscopy, WDX, EDX, TEM, XRD, BET and infrared spectroscopy.

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