J. Phys. IV France
Volume 09, Numéro PR8, September 1999Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|Page(s)||Pr8-553 - Pr8-560|
J. Phys. IV France 09 (1999) Pr8-553-Pr8-560
MOCVD of electroceramic oxides : A precursor manufacturer's perspectiveA.C. Jones, T.J. Leedham, J. Brooks and H.O. Davies
Inorgtech Limited, 25 James Carter Road, Mildenhall, Suffolk IP28 7DE, U.K.
Thin films of metal oxides are finding an increasing application in electronic devices. They can be deposited by a number of methods, however metalorganic chemical vapour deposition (MOCVD) offers the most flexible approach. Key to the success of this technology is the manufacture and supply of suitable precursors with sufficient volatility and stability, as well as adequate purity. In this article a number of manufacturing issues are discussed, as well as the development of new precursors with improved physical properties and enhanced MOCVD performance.
© EDP Sciences 1999