| Numéro |
J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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|
|---|---|---|
| Page(s) | Pr8-461 - Pr8-469 | |
| DOI | https://doi.org/10.1051/jp4:1999858 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-461-Pr8-469
DOI: 10.1051/jp4:1999858
1 Secció de Ciència del Materials, Institut Quimic de Sarrià, Universitat Ramón Llull, vía Augusta 390, 08017 Barcelona, Spain
2 Universitat Politécnica de Catalunya, Departament de Física Aplicada, Campus Nord UPC, 08034 Barcelona, Spain
3 Departament de Física Aplicada i Òptica, Facultat de Física, Avgda. Diagonal 647, 08028 Barcelona, Spain
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-461-Pr8-469
DOI: 10.1051/jp4:1999858
Plasma polymer thin films obtained by plasma polymerization of pyrrole
S. Borrós1, LI. Picazo1, N. Ferrer-Anglada2, Y. Takhtoukh1 and J. Esteve31 Secció de Ciència del Materials, Institut Quimic de Sarrià, Universitat Ramón Llull, vía Augusta 390, 08017 Barcelona, Spain
2 Universitat Politécnica de Catalunya, Departament de Física Aplicada, Campus Nord UPC, 08034 Barcelona, Spain
3 Departament de Física Aplicada i Òptica, Facultat de Física, Avgda. Diagonal 647, 08028 Barcelona, Spain
Abstract
Thin films obtained by plasma polymerization of pyrrole were deposited on different substrates. The polymer films were obtained in a R.F. plasma polymerization reactor from low-pressure vapor of the pyrrole monomer. The R.F. power and gas pressure were adjusted to obtain optimal deposition rate and film adhesion to substrates. The film composition was determined using InfraRed Transmission and X-ray Photoelectron Spectroscopy (XPS).
© EDP Sciences 1999