J. Phys. IV France
Volume 09, Numéro PR8, September 1999Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|Page(s)||Pr8-357 - Pr8-364|
J. Phys. IV France 09 (1999) Pr8-357-Pr8-364
The LPCVD of rutile at low temperaturesM.L. Hitchman1 and J. Zhao2
1 Department of Pure and Applied Chemistry, University of Strathclyde, 295 Cathedral Street, Glasgow G1 1XL, U.K.
2 NIBEC, University of Ulster, Newtownabbey, Co. Antrim BT37 0QB, North Ireland
The crystalline structures of titanium dioxide (TiO2) thin films deposited on various substrates by LPCVD for temperatures <322°C using titanium tetrabutoxide (TTB) have been studied. It has been found that the structures are dependent on the deposition temperature. XRD and Raman scattering show that amorphous TiO2 is formed below 215°C, anatase between 236°C~257°C, a mixture of anatase and rutile at ca 270°C, mainly rutile between 279°C-290°C, and pure rutile above 300°C.
© EDP Sciences 1999