J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
Page(s) Pr8-1147 - Pr8-1154
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition

J. Phys. IV France 09 (1999) Pr8-1147-Pr8-1154

DOI: 10.1051/jp4:19998143

Hybrid plasma polymerized membranes from organosilicon precursors for gas separation

S. Roualdes, N. Hovnanian, A. van der Lee, J. Sanchez and J. Durand

Laboratoire des Matériaux et Procédés Membranaires, UMR 5635, 8 rue de l'École Normale, 34296 Montpellier cedex 5, France

Thin a-SiOxCyHz films were deposited from different cyclic and linear organosilicon precursors in a radio-frequency plasma polymerization process. The plasma deposition and the film properties were characterized with respect to the deposition rate, the layers density and the chemical structure determined by FTIR and 29Si NMR analysis. The qualification of the films for gas-selective membranes was tested on ester of cellulose substrates using N2, H2, O2, CO2 and CH4. We are able to correlate both physico-chemical properties and permeation performances of the synthesized polymers with the composite parameter V/F.M (V : input voltage, F : monomer flow rate, M : monomer molecular weight) which describes the energetic character of the plasma. At low V/F.M ratios, the thin layers extremely preserve the monomeric structure and get close to polydimethylsiloxane ; this resemblance is all the more considerable that the precursor siloxane chain is longer, and particularly pronounced using cyclic monomers. As V/F.M increases, the plasma polymers have a more "inorganic" structure and higher density : the materials tend towards a silica-like structure. Concurrently, the synthesized membranes exhibit solution-diffusion controlled or Knudsen-like separation factors depending on whether plasma conditions are soft (low V/F.M ratios) or drastic (high V/F.M ratios).

© EDP Sciences 1999