J. Phys. IV France
Volume 09, Numéro PR8, September 1999Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|Page(s)||Pr8-1021 - Pr8-1028|
J. Phys. IV France 09 (1999) Pr8-1021-Pr8-1028
In situ characterization of atomic layer deposition processes by a mass spectrometerM. Ritala1, M. Juppo1, K. Kukli2, A. Rahtu1 and M. Leskelä1
1 Laboratory of Inorganic Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland
2 Institute of Experimental Physics and Technology, University of Tartu, Tähe 4, 51010 Tartu, Estonia.
In situ characterization of the chemical reactions in atomic layer deposition (ALD) processes in flow-type reactors is an important and challenging task. For this purpose, a quadrupole mass spectrometer has been integrated to an ALD reactor. The special features of this setup are described and its performance is demonstrated by studies on ALD oxide processes employing Al(CH3)3, Ti(OC2H5)4, Ta(OC2H5)5 and Nb(OC2H5)5 as metal precursors and water as the oxygen source.
© EDP Sciences 1999