J. Phys. IV France
Volume 08, Numéro PR7, October 19983rd International Workshop Microwave Discharges : Fundamentals and Applications
|Page(s)||Pr7-217 - Pr7-230|
J. Phys. IV France 08 (1998) Pr7-217-Pr7-230
Diagnostics of deposition plasmasD.C. Schram, M.C.M. van de Sanden, R. J. Severens and W.M.M. Kessels
Eindhoven University of Technology, Department of Applied Physics, P. O. Box 513, 5600 MB Eindhoven, The Netherlands
The diagnostics of plasmas used for deposition of thin layers and for the modification of surfaces are summarised. First the various processes are discussed : plasma production, the fragmentation of injected monomers, the transport of radicals, the processes at the surface and the desorption of new monomers in wall association. AU these processes have characteristic time constants, short for the plasma processes and long for processes, which involve wall interactions and recirculation in the deposition chamber. Several typical results are given, which elucidate the processes and the applicability of diagnostics.
© EDP Sciences 1998