Numéro
J. Phys. IV France
Volume 08, Numéro PR2, June 1998
Soft Magnetic Materials 13
Page(s) Pr2-461 - Pr2-464
DOI https://doi.org/10.1051/jp4:19982108
Soft Magnetic Materials 13

J. Phys. IV France 08 (1998) Pr2-461-Pr2-464

DOI: 10.1051/jp4:19982108

Cathode sputtered permalloy films of high anisotropic magnetoresistive effect

P. Aigner1, G. Stangl1, H. Hauser2 and J. Hochreiter3

1  Institut für Allgemeine Elektrotechnik und Elektronik, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Vienna, Austria
2  Institut für Werkstoffe der Elektrotechnik, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Vienna, Austria
3  Dipl.-Ing. Hans Schiebel Elektronische Geräte Gesellschaft m. b. H., Margaretenstrasse 112, 1050 Vienna, Austria


Abstract
The anisotropic magnetoresistive effect of dc-sputtered Ni 81% - Fe 19% films has been increased up to Δρ/ρ = 3.93% at 50 nm thickness. Investigations have been concentrated on the influence of the target current, the target-substrate-distance, and of the temperature of both target and substrate material. As a function of the applied magnetic bias field, the easy-axis coercivity of the permalloy film is between 100A/m and 200A/m due to induced anisotropy. The dc magnetization curves represent an almost ideal Stoner-Wohlfarth behaviour.



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