Numéro |
J. Phys. IV France
Volume 08, Numéro PR2, June 1998
Soft Magnetic Materials 13
|
|
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Page(s) | Pr2-461 - Pr2-464 | |
DOI | https://doi.org/10.1051/jp4:19982108 |
Soft Magnetic Materials 13
J. Phys. IV France 08 (1998) Pr2-461-Pr2-464
DOI: 10.1051/jp4:19982108
1 Institut für Allgemeine Elektrotechnik und Elektronik, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Vienna, Austria
2 Institut für Werkstoffe der Elektrotechnik, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Vienna, Austria
3 Dipl.-Ing. Hans Schiebel Elektronische Geräte Gesellschaft m. b. H., Margaretenstrasse 112, 1050 Vienna, Austria
© EDP Sciences 1998
J. Phys. IV France 08 (1998) Pr2-461-Pr2-464
DOI: 10.1051/jp4:19982108
Cathode sputtered permalloy films of high anisotropic magnetoresistive effect
P. Aigner1, G. Stangl1, H. Hauser2 and J. Hochreiter31 Institut für Allgemeine Elektrotechnik und Elektronik, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Vienna, Austria
2 Institut für Werkstoffe der Elektrotechnik, Technische Universität Wien, Gusshausstrasse 27-29, 1040 Vienna, Austria
3 Dipl.-Ing. Hans Schiebel Elektronische Geräte Gesellschaft m. b. H., Margaretenstrasse 112, 1050 Vienna, Austria
Abstract
The anisotropic magnetoresistive effect of dc-sputtered Ni 81% - Fe 19% films has been increased
up to Δρ/ρ = 3.93% at 50 nm thickness. Investigations have been concentrated on the influence
of the target current, the target-substrate-distance, and of the temperature of both target
and substrate material. As a function of the applied magnetic bias field,
the easy-axis coercivity of the permalloy film is between 100A/m and 200A/m due to
induced anisotropy. The dc magnetization curves represent an almost ideal Stoner-Wohlfarth
behaviour.
© EDP Sciences 1998