Numéro |
J. Phys. IV France
Volume 7, Numéro C2, Avril 1997
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
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Page(s) | C2-371 - C2-372 | |
DOI | https://doi.org/10.1051/jp4/1997021 |
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
J. Phys. IV France 7 (1997) C2-371-C2-372
DOI: 10.1051/jp4/1997021
1 LURE, bâtiment 209d, Centre Universitaire, 91405 Orsay, France
2 LURE, bâtiment 209d, Centre Universitaire, 91405 Orsay France
© EDP Sciences 1997
J. Phys. IV France 7 (1997) C2-371-C2-372
DOI: 10.1051/jp4/1997021
Resonance Effects on the Auger Spectra of Silicon in Porous Silicon
P. Lagarde1, M. Pompa2 and A.M. Flank11 LURE, bâtiment 209d, Centre Universitaire, 91405 Orsay, France
2 LURE, bâtiment 209d, Centre Universitaire, 91405 Orsay France
Abstract
Auger spectra of pure silicon, in-situ oxidized silicon and porous silicon have been recorded at different photon
energies across the K absorption edge of silicon and silica. The results show an intense resonant effect with, between the normal
Auger lines of pure silicon and silica, a new contribution whose intensity and energy position depends on the incident photon
energy. We discuss these results.
© EDP Sciences 1997