| Numéro |
J. Phys. IV France
Volume 7, Numéro C2, Avril 1997
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
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|---|---|---|
| Page(s) | C2-695 - C2-696 | |
| DOI | https://doi.org/10.1051/jp4:1997207 | |
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
J. Phys. IV France 7 (1997) C2-695-C2-696
DOI: 10.1051/jp4:1997207
Institut für Physikalische Chemie und Elektrochemie, Heinrich-Heine-Universität Düsseldorf, Universitätsstrasse 1, 40225 Düsseldorf, Germany
© EDP Sciences 1997
J. Phys. IV France 7 (1997) C2-695-C2-696
DOI: 10.1051/jp4:1997207
An Ex Situ Reflection Mode XANES Study of Underpotentially Deposited Copper Monolayers
P. Borthen and H.-H. StrehblowInstitut für Physikalische Chemie und Elektrochemie, Heinrich-Heine-Universität Düsseldorf, Universitätsstrasse 1, 40225 Düsseldorf, Germany
Abstract
Reflection mode XANES was performed ex situ on a copper monolayer underpotentially deposited onto a polycrystalline gold electrode. According to calculations based on reference substances, the thickness of the adsorbate layer was 0.21 nm and its oxidation state was close to +1. The ex situ spectra were found to be very similar to the previously published in situ data indicating that the adsorbate layer on the electrode surface does not significantly change after the removal from the electrolyte. The results showed that the reflection mode XAS is well suited for the study of adsorbate systems.
© EDP Sciences 1997