Numéro
J. Phys. IV France
Volume 7, Numéro C2, Avril 1997
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
Page(s) C2-679 - C2-681
DOI https://doi.org/10.1051/jp4:1997203
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure

J. Phys. IV France 7 (1997) C2-679-C2-681

DOI: 10.1051/jp4:1997203

Adsorption and Surface Reaction of SO2 on Cu(100) Studied by S K-Edge XAFS and STM

T. Nakahashi1, H. Hamamatsu1, S. Terada1, M. Sakano1, F. Matsui1, T. Yokoyama1, Y. Kitajima2 and T. Ohta1

1  Dept. of Chemistry, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
2  Photon Factory, National Laboratory for High Energy Physics, 1-1 oho, Tsukuba, Ibaraki 305, Japan


Abstract
Adsorption and reaction of SO2 on Cu(100) at room temperature has been studied by means of S K-edge XAFS, AES, LEED, XPS and STM. It has been revealed that there are atomic S and SO3 with the stoichiometric ratio of 1:2 on the surface. This indicates that a disproportionation reaction of 3SO2(a)→S(a)+2SO3(a) occurs at room temperature. The atomic S locates in the fourfold hollow site. SO3 adsorbs with its trigonal pyramid upright on the surface. The (2x2) and c(4x6) domains were observed by STM. The former contains only one SO3 species in the unit ceIl without atomic S, while the latter involves one SO3 and two atomic S. This implies the occurrence of drastic migration of resultant products.



© EDP Sciences 1997