| Numéro |
J. Phys. IV France
Volume 05, Numéro C7, Novembre 1995
Second International Conference on Ultra High Purity Base MetalsUHPM - 95 |
|
|---|---|---|
| Page(s) | C7-211 - C7-216 | |
| DOI | https://doi.org/10.1051/jp4:1995723 | |
Second International Conference on Ultra High Purity Base Metals
UHPM - 95
J. Phys. IV France 05 (1995) C7-211-C7-216
DOI: 10.1051/jp4:1995723
1 Japan Metals and Chemicals Co., Ltd., 8-4 Koami-cho, Nihon-bashi, Chuo-ku, Tokyo 103, Japan
2 Japan Metals and Chemicals (USA), Inc., One Innovation Drive, P.O. Box 12138, Research Triangle Park, NC 27709, U.S.A.
© EDP Sciences 1995
UHPM - 95
J. Phys. IV France 05 (1995) C7-211-C7-216
DOI: 10.1051/jp4:1995723
High Purity Chromium Metal Oxygen Distribution (Determined by XPS and EPMA)
K. Suzuki1 and H. Tomioka21 Japan Metals and Chemicals Co., Ltd., 8-4 Koami-cho, Nihon-bashi, Chuo-ku, Tokyo 103, Japan
2 Japan Metals and Chemicals (USA), Inc., One Innovation Drive, P.O. Box 12138, Research Triangle Park, NC 27709, U.S.A.
Abstract
The surface composition of ultra high purity chromium metal and chromium metal produced with conventional Cr+3 electrolyte was investigated via XPS. The distribution and formation of oxide in the matrix of chromium metal was also investigated via SEM. The results are discussed in terms of major elemental surface peaks for virgin material and after argon ion etching. It is demonstrated that the oxygen in ultra high purity chromium metal predominantly exists as a surface phenomenon in the form of Cr2O3 and the thickness of the oxide layer is a function of the production method.
© EDP Sciences 1995