Numéro
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
Page(s) C5-831 - C5-840
DOI https://doi.org/10.1051/jphyscol:1995599
Proceedings of the Tenth European Conference on Chemical Vapour Deposition

J. Phys. IV France 05 (1995) C5-831-C5-840

DOI: 10.1051/jphyscol:1995599

Development of TiN-Si3N4 Nano Composite Coatings for Wear Resistance Applications

A.G. Dias1, J.H. van Breda2, P. Moretto1 and J. Ordelman2

1  Commission of the European Communities, Joint Research Centre, Institute for Advanced Materials, P.O. Box 2, 1755 ZG Petten, The Netherlands
2  Netherlands Energy Research Foundation (ECN), Energy Engineering Division, P.O. Box 1, 1755 ZG Petten, The Netherlands


Abstract
The engineering of conventional TiN coatings to attain hardness of the order of ultrahard coatings (e.g. c-BN) by a controlled incorporation of silicon atoms in the titanium nitride lattice leading to the formation of a TiN-Si3N4 composite material is discussed. An a-priori thermodynamic approach complemented by themochemical equilibrium calculations was used to evaluate convenient precursors and processing parameters for the production of this novel coating material. The multiphase nature of preliminary test samples deposited by PACVD is confirmed by X-ray diffraction, IR spectroscopy and EPMA analysis. The films are made up of TiN nanocrystallites embedded in an amorphous Si3N4 tissue with small amounts of free Si, as predicted by previous Ti-Si-N phase diagram calculations.



© EDP Sciences 1995