| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C5-509 - C5-516 | |
| DOI | https://doi.org/10.1051/jphyscol:1995559 | |
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
J. Phys. IV France 05 (1995) C5-509-C5-516
DOI: 10.1051/jphyscol:1995559
1 Centro di Studi sulla Stabilità e Reattività dei Composti di Coordinazione del CNR, Dipartimento di Chimica Inorganica Metallorganica ed Analitica, Via Marzolo 1, Università di Padova, 35141 Padova, Italy
2 Nesmeyanov Institute of Organoelement Compounds, 28 Vavilov Str., 117813 Moscow, Russia
© EDP Sciences 1995
J. Phys. IV France 05 (1995) C5-509-C5-516
DOI: 10.1051/jphyscol:1995559
Deposition of MoO3 Films from a Volatile Molybdenyl Complex
B. Ballarin1, E. Brescacin2, G.A. Rizzi2 and E. Tondello21 Centro di Studi sulla Stabilità e Reattività dei Composti di Coordinazione del CNR, Dipartimento di Chimica Inorganica Metallorganica ed Analitica, Via Marzolo 1, Università di Padova, 35141 Padova, Italy
2 Nesmeyanov Institute of Organoelement Compounds, 28 Vavilov Str., 117813 Moscow, Russia
Abstract
A volatile molybdenyl complex was used as precursor for MOCVD of MoO3 films. Decomposition paths were investigated by thermal analysis. Good quality films were obtained on different substrates and characterized by XPS, UV-Vis, XRD and SEM analyses. The different electronic properties of the various films on different substrates were studied by photoemission experiments and compared with respect to the MoO3 single crystal.
© EDP Sciences 1995