| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C5-1037 - C5-1043 | |
| DOI | https://doi.org/10.1051/jphyscol:19955122 | |
J. Phys. IV France 05 (1995) C5-1037-C5-1043
DOI: 10.1051/jphyscol:19955122
OMCVD on Fluidized Divided Substrates : a Potential Method for the Preparation of Catalysts
R. Feurer1, A. Reynes1, P. Serp2, P. Kalck2 and R. Morancho11 Laboratoire de Cristallochimie, Réactivité et Protection des Matériaux, URA 445 du CNRS, ENSCT, 118 Route de Narbonne, 31077 Toulouse cedex, France
2 Laboratoire de Chimie des Procédés, ENSCT, 118 Route de Narbonne, 31077 Toulouse cedex, France
Abstract
The OMCVD method has been used to deposit highly pure metal particles on porous divided substrates in order to prepare metal supported catalysts. A fluidized bed reactor has been especially designed and the requirements of CVD and fluidization have been taken into account to select convenient experimental conditions. Three organometallic compounds of rhodium have been selected and their thermal decomposition under He and He/H2 mixtures studied by infrared spectroscopy and on-line mass spectrometry analyses. The deposition are carried out at a total pressure of 100 Torr and substrate temperatures as low as 100 °C. The solid deposits have been characterized by XPS, the size and dispersion of the particules have been determined by chemisorption methods or measured by TEM. These catalysts can be used without further treatment and their performances have been compared to those of conventionally prepared ones.
© EDP Sciences 1995