Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
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Page(s) | C5-975 - C5-987 | |
DOI | https://doi.org/10.1051/jphyscol:19955115 |
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
J. Phys. IV France 05 (1995) C5-975-C5-987
DOI: 10.1051/jphyscol:19955115
CSELT SpA, Via G. Reiss Romoli 274, 10148 Torino, Italy
© EDP Sciences 1995
J. Phys. IV France 05 (1995) C5-975-C5-987
DOI: 10.1051/jphyscol:19955115
Chemical Vapour Deposition for Optical Fibre Technology
L. CognolatoCSELT SpA, Via G. Reiss Romoli 274, 10148 Torino, Italy
Abstract
At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been performed, introducing several methods to produce fibres with geometry and optical properties optimised for different applications. An overview of the different methods is given, and the problems which have been to be solved in these years are described.
© EDP Sciences 1995