| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C5-927 - C5-934 | |
| DOI | https://doi.org/10.1051/jphyscol:19955110 | |
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
J. Phys. IV France 05 (1995) C5-927-C5-934
DOI: 10.1051/jphyscol:19955110
1 CNRS/CEMES-LOE, MEA, BP. 4347, 31055 Toulouse, France
2 CSIC/ICMAB, Campus UAB, 08193 Bellaterra, Spain
3 S.E. CARBUROS METALICOS, Pg Zona Franca 14, 08038 Barcelona, Spain
© EDP Sciences 1995
J. Phys. IV France 05 (1995) C5-927-C5-934
DOI: 10.1051/jphyscol:19955110
HREM Characterization of Interfaces in Thin MOCVD Superconducting Films
D. Dorignac1, S. Schamm1, Ch. Grigis1, J. Santiso2, G. Garcia3 and A. Figueras21 CNRS/CEMES-LOE, MEA, BP. 4347, 31055 Toulouse, France
2 CSIC/ICMAB, Campus UAB, 08193 Bellaterra, Spain
3 S.E. CARBUROS METALICOS, Pg Zona Franca 14, 08038 Barcelona, Spain
Abstract
This paper is concerned with high-Tc, superconducting compounds produced by metal-organic chemical vapour deposition. The nanostructure of different types of interfaces - yttria stabilized zirconia buffer / (1-102)-sapphire substrate, YBa2Cu3O7-x film / Y2O3 precipitates as well as YBa2Cu3O7-x film / (001)-NdGaO3, -SrTiO3, and -MgO substrates - has been investigated by high resolution electron microscopy. The orientation relationships and the corresponding layer sequences across the interfaces have been determined with the aid of computer simulations.
© EDP Sciences 1995