| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | C5-87 - C5-88 | |
| DOI | https://doi.org/10.1051/jphyscol:1995507 | |
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
J. Phys. IV France 05 (1995) C5-87-C5-88
DOI: 10.1051/jphyscol:1995507
Dipartimento di Scienze Chimiche, Università di Catania, 95125 Cutania, Italy
© EDP Sciences 1995
J. Phys. IV France 05 (1995) C5-87-C5-88
DOI: 10.1051/jphyscol:1995507
Metal-Containing Thin Film MOCVD : Kinetics and Reaction Mechanisms
I. FragalàDipartimento di Scienze Chimiche, Università di Catania, 95125 Cutania, Italy
Abstract
© EDP Sciences 1995