| Numéro |
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
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| Page(s) | C2-233 - C2-239 | |
| DOI | https://doi.org/10.1051/jp4:1991229 | |
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
J. Phys. IV France 02 (1991) C2-233-C2-239
DOI: 10.1051/jp4:1991229
Department of Electronic Science, Jilin University, 79 Jiefang Road, Changchun 130021, P.R. China
© EDP Sciences 1991
J. Phys. IV France 02 (1991) C2-233-C2-239
DOI: 10.1051/jp4:1991229
A STUDY OF α-Fe2O3 ULTRAFINE PARTICLE FILMS
D. GUORUI, C. LIHUA, Y. BAILIANG and L. MINGDENGDepartment of Electronic Science, Jilin University, 79 Jiefang Road, Changchun 130021, P.R. China
Abstract
α-Fe2O3 thin films have been successfully fabricated onto silicon or ceramic by using PECVD method. The conditions for preparation of α-Fe2O3 films, which deposited from Fe(CO)5 and O2 in an r.f. flow discharge, have been discussed. The compositions and the structures of the thin films have been investigated by means of modern analysis techniques. The mean particle size of [MATH]-Fe2O3 ultrafine particle films were measured with the Mössbauer effect.
© EDP Sciences 1991