Journal de Physique IV

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Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition

H. Masumoto and T. Hirai

J. Phys. IV France, 05 C5 (1995) C5-671-C5-677

DOI: 10.1051/jphyscol:1995580

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