Journal de Physique IV

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Thermal stability of Gd₂O₃/Si(100) interfacial transition layer

H. Nohira, T. Yoshida, H. Okamoto, S. Shinagawa, W. Sakai, K. Nakajima, M. Suzuki, K. Kimura, Ng Jin Aun, Y. Kobayashi et al. (6 more)

J. Phys. IV France, 132 (2006) 273-277

Published online: 11 March 2006

DOI: 10.1051/jp4:2006132052

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H. Nohira

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