Journal de Physique IV

Journals
Books
Conferences

0

Subscriber Authentication Point

Sign in with login/password
Your subscription

EDPS Account

Login

All journal archives
All issues
Subscription / One-time purchase

Search

Menu

Subscription / One-time purchase
Reader's services
1872-1962
1963-1990
1991-2006
Current journals

Advanced Search

Subscription / One-time purchase
Reader's services
1872-1962
1963-1990
1991-2006
Current journals

Advanced Search
Help

Thermal stability of Gd₂O₃/Si(100) interfacial transition layer

H. Nohira, T. Yoshida, H. Okamoto, S. Shinagawa, W. Sakai, K. Nakajima, M. Suzuki, K. Kimura, Ng Jin Aun, Y. Kobayashi et al. (6 more)

J. Phys. IV France, 132 (2006) 273-277

Published online: 11 March 2006

DOI: 10.1051/jp4:2006132052

This search tool will display articles in Google Scholar database by authors of the selected article:

Select your author(s):

H. Nohira

T. Yoshida

H. Okamoto

S. Shinagawa

W. Sakai

K. Nakajima

M. Suzuki

K. Kimura

Ng Jin Aun

Y. Kobayashi

S. Ohmi

H. Iwai

E. Ikenaga

Y. Takata

K. Kobayashi

T. Hattori

Select all
Remove all

Search method:

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)