Journal de Physique IV

Some recent developments in chemical vapor deposition process and equipment modeling

C.R. Kleijn, K.J. Kuijlaars, M. Okkerse, H. van Santen and H.E.A. van den Akker

J. Phys. IV France, 09 PR8 (1999) Pr8-117-Pr8-132

DOI: 10.1051/jp4:1999815

C.R. Kleijn

K.J. Kuijlaars

M. Okkerse

H. van Santen

H.E.A. van den Akker

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)