Journal de Physique IV

Process and characterization of (Pb,La)TiO₃ thin films deposited by MOCVD for gigabit DRAM application

S.-S. Lee, Y.-M. Kang, J. Lee, D.-H. Lee and H.-G. Kim

J. Phys. IV France, 08 PR9 (1998) Pr9-269-Pr9-272

DOI: 10.1051/jp4:1998953

S.-S. Lee

Y.-M. Kang

J. Lee

D.-H. Lee

H.-G. Kim

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)