Journal de Physique IV

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PROTECTION AGAINST OXIDATION OF C/SiC COMPOSITES BY CHEMICAL VAPOUR DEPOSITION OF TITANIUM DIBORIDE : DEPOSITION KINETICS AND OXIDATION BEHAVIOUR OF FILMS PREPARED FROM TiCl₄/BCl₃/H₂ MIXTURES

C. COURTOIS, J. DESMAISON and H. TAWIL

J. Phys. IV France, 02 C2 (1991) C2-657-C2-664

DOI: 10.1051/jp4:1991279

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