Journal de Physique IV

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LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

C. PIJOLAT, L. BRUNO and R. LALAUZE

J. Phys. IV France, 02 C2 (1991) C2-303-C2-310

DOI: 10.1051/jp4:1991237

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