Journal de Physique IV

PROCESSING OF WSi₂ FILMS BY LOW PRESSURE CHEMICAL VAPOR DEPOSITION FROM IN SITU CHLORINATION OF METAL

E. BLANQUET, N. THOMAS, P. SURYANARAYANA, C. VAHLAS, C. BERNARD and R. MADAR

J. Phys. IV France, 02 C2 (1991) C2-873-C2-880

DOI: 10.1051/jp4:19912104

E. BLANQUET

N. THOMAS

P. SURYANARAYANA

C. VAHLAS

C. BERNARD

R. MADAR

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)