Articles citing this article

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Cited article:

Atmospheric-pressure low-temperature plasma processes for thin film deposition

Hiroaki Kakiuchi, Hiromasa Ohmi and Kiyoshi Yasutake
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 32 (3) (2014)
https://doi.org/10.1116/1.4828369

Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non‐thermal Non‐equilibrium Plasmas

S. E. Alexandrov and M. L. Hitchman
Chemical Vapor Deposition 11 (11-12) 457 (2005)
https://doi.org/10.1002/cvde.200500026