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Atmospheric-pressure low-temperature plasma processes for thin film deposition

Hiroaki Kakiuchi, Hiromasa Ohmi and Kiyoshi Yasutake
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 32 (3) 030801 (2014)
DOI: 10.1116/1.4828369
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Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non-thermal Non-equilibrium Plasmas

S. E. Alexandrov and M. L. Hitchman
Chemical Vapor Deposition 11 (11-12) 457 (2005)
DOI: 10.1002/cvde.200500026
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Plasma generation and plasma sources

H Conrads and M Schmidt
Plasma Sources Science and Technology 9 (4) 441 (2000)
DOI: 10.1088/0963-0252/9/4/301
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