GeO2 and SiO2 thin film preparation with CVD using ultraviolet excimer lamps
J. Phys. IV France, 11 PR3 (2001) Pr3-739-Pr3-745
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Atmospheric Pressure Deposition of Silica Thin Film by Photo-CVD Using Vacuum Ultraviolet Excimer Lamp
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DOI: 10.2184/lsj.32.54
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