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Cited article:

MOCVD of ferroelectric thin films

C. Schmidt, W. Lehnert, T. Leistner, L. Frey, H. Ryssel

J. Phys. IV France, 09 PR8 (1999) Pr8-575-Pr8-582

DOI: https://doi.org/10.1051/jp4:1999872

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This article has been cited by the following article(s):

Metal-organic chemical-vapor deposition of (Ba,Sr)TiO[sub 3]: Nucleation and growth on Pt-(111)

S. Regnery, Y. Ding, P. Ehrhart, et al.
Journal of Applied Physics 98 (8) 084904 (2005)
https://doi.org/10.1063/1.2084312