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Cited article:

Thermodynamical and experimental conditions of hafnium carbide chemical vapour deposition

P. Sourdiaucourt, A. Derré, P. Delhaès, P. David

J. Phys. IV France, 09 PR8 (1999) Pr8-373-Pr8-380

DOI: https://doi.org/10.1051/jp4:1999846

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This article has been cited by the following article(s):

Metalorganic chemical vapor deposition of Cu films from bis(t-butyl-3-oxo-butanoato)copper(II): thermodynamic investigation and experimental verification

Sukanya Mukhopadhyay, K. Shalini, R. Lakshmi, Anjana Devi and S.A. Shivashankar
Surface and Coatings Technology 150 (2-3) 205 (2002)
https://doi.org/10.1016/S0257-8972(01)01540-7